MIT achieves finer pattern of lines in microchips
Posted By: Jaiyant Cavale | Jul 9 2008
Researchers at MIT have revealed achievements of achieving finer patterns of lines in chips and other electronic devices. What is seen as a major advance in Nanoscale lithographic technology, the team has created about 25 nanometers wide and each separated by a space of the same dimension. Many feel that MIT's findings are particularly attractive because they are affordable and could also ameliorate the performance of computers. The findings conclude that control of the lithographic imaging process is not a limiting factor but can be empowering in the construction of new machines. MIT received financial support from the NASA and NSF for the project.
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Via: MIT
