Apple iPhone 6 to feature Sharp’s low-temperature p-Si LCD display

Apple has reportedly tied up with the Japanese electronic firm Sharp to build the next-generation low-temperature poly-silicon LCD displays for its upcoming iPhone version in 2012. The new display will be far thinner and will feature higher aperture than the traditional LCD displays. Indeed, Apple iPhone 6, expected to hit the stores in spring next year, will be known for its p-Si LCD display similar to Apple iPhone 4 that took name for its Retina Display.

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According to a Japanese newspaper, Nikkan, Sharp has already started to work with the p-Si LCD display for iPhone 6. Sharp’s Kameyama Plant No. 1, famous for LCD productions, is put aside for the development of the innovative display, sources indicated. The new display, p-Si LCD, the thin film transistor, TFT is made of polycristalline silicon. The advanced technology helps display drivers mount directly onto the glass, simply meaning that much of the weight can be reduced this way.

All other key components of an LCD display such as optical sensors and signal processing circuits can be thus integrated with the glass substrate of the display. Of course, the major advantage of the display is that it will be thinner and at the same time clearer and accurate. Apple might have preferred the technology well because of these features. The Cupertino technology innovator always wants to shrink the size of its devices every time.

Less battery consumption of Sharp’s p-Si LCD display is an additional benefit for the iPhone maker. Apple’s plan to launch p-Si LCD display on iPhone 6 means that the technology maker has bunked the celebrated Retina Display of iPhone 4. As well, Apple might have decided against the featured low-power organic LED displays, which mobilized smartphones like Samsung Galaxy S.

Via: AppleInsider